品牌：Oxford Instruments 型号：Plasma Pro 100 Cobra300 简介：可用于硅，二氧化硅，氮化硅，碳化硅表面微纳结构的刻蚀。六种标准工艺:High rate DSiE，High Aspect Ratio DSiE, SiO2 shallow etch(RIE Mode and ICP Mode),SiN etch, SiC etch.